X-ray photoelectron spectroscopy (XPS) also called Electron Spectroscopy for Chemical Analysis (ESCA) is a chemical surface analysis method. XPS measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers. All elements except for H and He can be detected at concentrations above 0.05 to 1.0 atom %, depending on the element. In addition, chemical bonding information can be determined from detailed analysis. Conductive and nonconductive samples can be measured and the technique is well suited for polymeric materials. The sampled area varies from 1 mm down to 30 µm in diameter.

Selenium oxide deposit identified in process tubing.

Carbon functionality described for ammonia treated fiber.

Competitive product analysis reveals DyF₃ film.

Sputter Depth Profile of Unknown Optical Film.